Perovskite ManufacturingJiangsu Hydrogen Intelligent Equipment Co., Ltd.为您全面展示Perovskite Manufacturing的产品分类，涵盖Perovskite Manufacturing下所有产品的功能用途、型号规格、适用范围、高清图片、相关新闻及市场价格。同时，我们精心汇集了Perovskite Manufacturing分类相关的行业资讯、价格动态、展会信息及图文资料，广受全国用户好评。如需了解更多详情，欢迎点击查看！
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Laboratory-Scale Perovskite Planar Coating System
Application Scope:
Designed for laboratory preparation of perovskite layers, passivation layers, SAM, and other functional layers for perovskite solar cells. Also applicable to wet-film processing in broader semiconductor applications, including LCD panels, touchscreens, optical films, and advanced packaging products.
Technical Specifications:
Substrate Dimension Range：200mm×200mm~400mm×400mm
Wet Coating Thickness：≥3μm
Dry Film Thickness Uniformity：±3%（@500nm）
aximum Coating Speed：100mm/s
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Production-Line Perovskite Planar Coating Machine
Application Scope:
Designed for perovskite solar cell production lines, enabling precise deposition of perovskite layers, passivation layers, SAM layers, and other functional coatings. Also compatible with wet-film processes in the broader semiconductor industry, including LCD panels, touchscreens, optical films, and advanced packaging.
Technical Specifications:
Substrate Coverage：600mm×600mm~ 2400mm×1200mm
Wet Coating Thickness：≥3μm
Dry Film Uniformity：±5%（@500nm）
Maximum Coating Speed：80mm/s
Production Rate：~1 PPM (with high-speed loading/unloading system)
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Crystalline Silicon Tandem Perovskite Planar Coating Equipment
Application Scope:
Designed for production lines or laboratory use, enabling precise deposition of perovskite layers, passivation layers, SAM layers, and other functional coatings for crystalline silicon tandem perovskite solar cells.
Technical Specifications:
Substrate Compatibility:166×166 mm, 182×182 mm, 182×91 mm, 182×210 mm, 210×210 mm, 210×105 mm silicon wafers
Wet Coating Thickness: ≥3μm
Dry Film Uniformity：±5%（@1000nm）
Maximum Coating Speed:100mm/s
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Laboratory-Scale Vacuum Crystallization System
Application Scope:
Designed for perovskite solar cell R&D, this equipment performs drying and crystallization of functional layers after coating. It is also compatible with laboratory-scale drying and small-batch processing for other wet-film semiconductor applications, such as LCD panels, touch screens, optical films, and advanced packaging.
Technical Specifications:
Compatible Substrate Size：100×100 mm to 400×400 mm (including silicon wafers)
Chamber Dimensions：240mm×240mm×80mm ~ 450mm×450mm×120mm
Vacuum Rate：Standard 10s to 10Pa; Optional: 30s to 1Pa, 5s to 10Pa, 3s to 150Pa
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Production-Line Vacuum Crystallization Machine
Application Scope:
Designed for perovskite solar cell production lines, this system performs drying and crystallization of coated functional layers, including perovskite, passivation, and SAM layers. It also meets precision drying requirements for other wet-film semiconductor applications such as LCD panels, touch screens, optical films, and advanced packaging.
Technical Specifications:
Chamber Dimensions：1350mm×650mm×100mm ~ 2600mm×1350mm×150mm
Vacuum Rate：Standard 10s to 10Pa; Optional: 2s to 150Pa, 3s to 150Pa, 5s to 10Pa
Production Cycle：~ 1 PPM (requires high-speed loading/unloading system)
