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Production-Line Perovskite Planar Coating Machine
Application Scope:
Designed for perovskite solar cell production lines, enabling precise deposition of perovskite layers, passivation layers, SAM layers, and other functional coatings. Also compatible with wet-film processes in the broader semiconductor industry, including LCD panels, touchscreens, optical films, and advanced packaging.
Technical Specifications:
Substrate Coverage：600mm×600mm~ 2400mm×1200mm
Wet Coating Thickness：≥3μm
Dry Film Uniformity：±5%（@500nm）
Maximum Coating Speed：80mm/s
Production Rate：~1 PPM (with high-speed loading/unloading system)
