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Laboratory-Scale Perovskite Planar Coating System
Application Scope:
Designed for laboratory preparation of perovskite layers, passivation layers, SAM, and other functional layers for perovskite solar cells. Also applicable to wet-film processing in broader semiconductor applications, including LCD panels, touchscreens, optical films, and advanced packaging products.
Technical Specifications:
Substrate Dimension Range：200mm×200mm~400mm×400mm
Wet Coating Thickness：≥3μm
Dry Film Thickness Uniformity：±3%（@500nm）
aximum Coating Speed：100mm/s
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Production-Line Perovskite Planar Coating Machine
Application Scope:
Designed for perovskite solar cell production lines, enabling precise deposition of perovskite layers, passivation layers, SAM layers, and other functional coatings. Also compatible with wet-film processes in the broader semiconductor industry, including LCD panels, touchscreens, optical films, and advanced packaging.
Technical Specifications:
Substrate Coverage：600mm×600mm~ 2400mm×1200mm
Wet Coating Thickness：≥3μm
Dry Film Uniformity：±5%（@500nm）
Maximum Coating Speed：80mm/s
Production Rate：~1 PPM (with high-speed loading/unloading system)
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Crystalline Silicon Tandem Perovskite Planar Coating Equipment
Application Scope:
Designed for production lines or laboratory use, enabling precise deposition of perovskite layers, passivation layers, SAM layers, and other functional coatings for crystalline silicon tandem perovskite solar cells.
Technical Specifications:
Substrate Compatibility:166×166 mm, 182×182 mm, 182×91 mm, 182×210 mm, 210×210 mm, 210×105 mm silicon wafers
Wet Coating Thickness: ≥3μm
Dry Film Uniformity：±5%（@1000nm）
Maximum Coating Speed:100mm/s
